System Summary:

An abbreviated instrument specification.

VACUUM SYSTEM

• Sample analysis chamber (SAC)
• 150l/s turbomolecular pump (base pressure 5x10^-7Pa)

SAMPLE INTRODUCTION CHAMBER

• 50l/s turbomolecular pump
• 10 sample introduction chamber (optional)

SYSTEM BAKING

• integrated timer controlled heating tapes

SAMPLE HANDLING

• 10 sample carousel
• fully software controlled

SAMPLE DIMENSIONS

• ≤10mm diameter
• ≤ 5mm thick

SAMPLE PREPARATION & HANDLING (OPTIONS)

• Air sensitive transport device
• High temperature gas reaction cell

X-RAY SOURCE

•  Dual Mg/Al anodes
• conical formed magnesium target
• 300W max power 12kV 25mA

ELECTRON ENERGY ANALYSER

• Low pass/high pass filter
• selectable pass energy, 25, 75, and 150eV
• single channeltron detector

ION ETCHING SYSTEM

• Standard ion etching source

0.5, 1, 1.5, and 2kV accelerating voltage
Etch rate 5-100 Angstrom/min (material dependent)
sample rotation during etching

• Kaufman high speed etching source (option)

0-1000V accelearting potential (continuously variable)
Etch rate 50-800 Angstrom/min (material dependent)



Kratos Analytical Ltd has a policy of continuous product improvement and therefore reserves the right to make alterations to specifications without notice.  Whilst Kratos Analytical Ltd believes  this documentation to be true and accurate, Kratos Analytical cannot be held responsible for any errors and omissions contained herein.